Applied Materials (AMAT) is a publicly traded Lithography & Equipment company founded in 1967 and based in Santa Clara, USA.
| Date | Stage | Amount | Valuation | Lead investors |
|---|---|---|---|---|
| Oct 5, 1972 | IPO | $3M | — | — |
Applied Materials reported record Q2 FY2026 revenue of $7.91 billion, up 11% year over year from $7.10 billion. GAAP gross margin was 49.9%, GAAP operating margin was 31.9%, and GAAP diluted EPS was a record $3.51, up 33% YoY from $2.63. Non-GAAP diluted EPS was $2.86, up 20% YoY. Semiconductor Systems revenue rose to $5.97 billion (up from $5.40 billion), with foundry/logic at 67% of segment revenue, DRAM at 29%, and flash at 4%. Applied Global Services revenue was $1.67 billion, up from $1.42 billion. The company announced multiple EPIC Center partner engagements including TSMC, SK hynix, Micron, Advantest, and three universities, and agreed to acquire ASMPT's NEXX business for advanced packaging. The quarterly dividend was raised 15% to $0.53 per share. For Q3 FY2026, Applied expects revenue of $8.95 billion ± $500 million and non-GAAP diluted EPS of $3.36 ± $0.20.
Q3 FY2026 revenue $8.45B–$9.45B; non-GAAP EPS $3.16–$3.56
Applied Materials owns the broadest toolset in wafer fabrication — deposition, etch, implant, metrology — with decades of process co-development baked into every fab's recipes, a barrier tested across every downturn since the 1980s. Tool prices rise with each node's complexity and a services base attaches to the installed fleet, though overlap with Lam and Tokyo Electron keeps pricing disciplined rather than dictated. No fab gets built without its equipment, so demand defers but never disappears. The live risk is policy: China export rules decide a large slice of shipments.

Photoluminescence inspection offers new defect detection for SiC and GaN wafer manufacturing as the industry transitions to larger substrate sizes.

Inspection and metrology tools adapt to the demands of high-density fan-out panel packaging for large AI/HPC devices.

Deep UV lithography processing remains critical to EUV manufacturing, enabling continued Moore's Law advancement in logic and memory nodes.
Tools that lay down the ultra-thin conductive, dielectric, and barrier films forming each layer of a chip, using chemical vapor deposition, physical vapor deposition (sputtering), and epitaxial growth. Applied Materials is the market leader in deposition, and its Endura and Producer platforms are workhorses in virtually every advanced fab. These systems are critical for gate-all-around transistors and advanced interconnects.
Equipment that precisely removes material to define transistor and interconnect structures, including conductor and dielectric etch plus selective-removal tools like the Sym3 and SelectraTM platforms. Atomic-scale precision is essential as features shrink and 3D architectures (3D NAND, gate-all-around) proliferate, making etch one of the fastest-growing and most technically demanding steps in chipmaking.
Imaging, metrology, and inspection systems—including high-resolution eBeam tools—that measure dimensions and detect defects across the wafer to maximize yield. As process margins tighten at advanced nodes, this PDC portfolio gives fabs the visibility needed to control variation. It is a high-growth, high-margin segment central to Applied's role in enabling smaller, denser chips.
Equipment for chiplet-based and 3D integration—through-silicon vias, hybrid bonding, and wafer-level packaging—that stitches multiple dies into a single high-performance package. As transistor scaling slows, advanced packaging is increasingly where AI-accelerator performance gains come from, positioning Applied Materials at the center of heterogeneous-integration roadmaps for HBM and multi-die designs.
530 patents on file, but none with both an extractable figure and an abstract on Google Patents yet.