ASML (ASML) is a publicly traded Lithography & Equipment company founded in 1984 and based in Veldhoven, Netherlands.
| Date | Stage | Amount | Valuation | Lead investors |
|---|---|---|---|---|
| Feb 1, 1995 | IPO | $170M | — | — |
Every leading-edge fab on earth — TSMC, Samsung, Intel — depends on ASML's EUV lithography systems, a monopoly built on two decades of Zeiss optics co-development that no rival, however well funded, has meaningfully closed. The position shows up where it counts: system prices have multiplied across generations while the order book stays years deep, and purchases defer in downturns but are never skipped. The live risks are political rather than technical — export policy decides where machines ship, not whether customers want them.

Intel deploys $400M in ASML lithography equipment for Panther Lake chip production.

ASML's stock price reflects ongoing demand for its advanced chipmaking lithography tools.

ASML insiders trim positions, but the company's €38.8B order backlog signals sustained demand.
China debuts a prototype EUV lithography machine, posing a potential long-term challenge to ASML's dominance.

ASML stock price holds steady amid ongoing chip-equipment demand trends.

ASML's upcoming Q2 report is preceded by a $26.5B order backlog and lingering US export policy uncertainty.
Extreme ultraviolet lithography scanners using 13.5nm light to pattern the smallest features on leading-edge logic and memory chips at 7nm and below. Each NXE-series machine costs roughly $150–200M and is essential for TSMC, Samsung, and Intel's most advanced nodes. ASML is the world's sole supplier of production EUV, making these systems the critical chokepoint in advanced chip manufacturing.
Next-generation EUV systems with a 0.55 numerical-aperture optical design that prints finer features in a single exposure, extending Moore's Law toward the 2nm era and beyond. Priced around $350M+ each, the EXE platform began shipping to leading customers including Intel and TSMC. High-NA EUV is ASML's most advanced product and a multi-year competitive moat in lithography.
Deep ultraviolet immersion and dry scanners (NXT/XT lines using 193nm light) that pattern mainstream and mature semiconductor nodes for logic, memory, automotive, and analog chips. DUV represents the high-volume backbone of ASML's installed base and remains central to export-control disputes over sales to China. The systems deliver high throughput and overlay accuracy for cost-sensitive production.
Optical and e-beam metrology and inspection tools (largely from the HMI acquisition) plus computational-lithography software that optimize patterning and detect defects across the fab. Combined with ASML's holistic-lithography portfolio, these products improve yield and process control for EUV and DUV production, broadening ASML beyond scanners into a fuller fab-equipment and software supplier.
495 patents on file, but none with both an extractable figure and an abstract on Google Patents yet.