Tokyo Electron (8035.T) is a publicly traded Lithography & Equipment company founded in 1963 and based in Tokyo, Japan.
| Date | Stage | Amount | Valuation | Lead investors |
|---|---|---|---|---|
| Jun 1, 1980 | IPO | — | — | — |
Tokyo Electron's flagship lithography track systems, which coat photoresist onto wafers and develop them after exposure. TEL holds roughly 90% global share in coater/developers, making its tracks effectively mandatory companions to ASML's EUV and DUV scanners in every advanced fab. The ACT Series integrates resist coating, post-exposure bake, and development modules, anchoring TEL's dominance in front-end-of-line patterning.
TEL's plasma etch platform, introduced in 2006 with a space-saving rectangular cluster design and industry-leading wafer-transfer speed and footprint. Tactras provides high-aspect-ratio hole and trench etch, mask and dielectric etch, and BEOL dielectric etch for advanced logic and 3D NAND. It is TEL's principal competitor to Lam Research and Applied Materials in the large conductor/dielectric etch market.
Single-wafer deposition systems for 300mm processing that perform high-precision metal deposition such as titanium, titanium nitride, and tungsten for plug and electrode formation. The modular Triase+ architecture lets fabs combine multiple process modules in one platform with high tool reliability, supporting the metallization steps of advanced logic and memory manufacturing.
564 patents on file, but none with both an extractable figure and an abstract on Google Patents yet.